数学物理学报(英文版) ›› 2010, Vol. 30 ›› Issue (1): 180-186.doi: 10.1016/S0252-9602(10)60035-5

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APPLICATION OF MINIMUM PROJECTION UNIFORMITY CRITERION IN COMPLEMENTARY DESIGNS

宋硕, 覃红   

  1. 1.Department of Statistics, Central China Normal University, Wuhan 430079, China;
    2.College of Science, Wuhan University of Science and Technology, Wuhan 430065, China
  • 收稿日期:2006-12-30 修回日期:2008-02-10 出版日期:2010-01-20 发布日期:2010-01-20
  • 基金资助:

    This research was partially supported by the NSF of China (10671080),  NCET (06-672) and the Key Project of Chinese Ministry of Education (105119).

APPLICATION OF MINIMUM PROJECTION UNIFORMITY CRITERION IN COMPLEMENTARY DESIGNS

 SONG Shuo, QIN Hong   

  1. 1.Department of Statistics, Central China Normal University, Wuhan 430079, China;
    2.College of Science, Wuhan University of Science and Technology, Wuhan 430065, China
  • Received:2006-12-30 Revised:2008-02-10 Online:2010-01-20 Published:2010-01-20
  • Supported by:

    This research was partially supported by the NSF of China (10671080),  NCET (06-672) and the Key Project of Chinese Ministry of Education (105119).

摘要:

In this article, we consider the characterization problem in design theory. The objective is to characterize minimum
projection uniformity for two-level designs in terms of their complementary designs. Here, the complementary design means a design in which all the Hamming distances of any two runs are the same, which generalizes the concept of a pair of complementary designs in the literature. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity (MPU) rule to assess and compare two-level factorials.

关键词: minimum projection uniformity, complementary design, uniformity pattern

Abstract:

In this article, we consider the characterization problem in design theory. The objective is to characterize minimum
projection uniformity for two-level designs in terms of their complementary designs. Here, the complementary design means a design in which all the Hamming distances of any two runs are the same, which generalizes the concept of a pair of complementary designs in the literature. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity (MPU) rule to assess and compare two-level factorials.

Key words: minimum projection uniformity, complementary design, uniformity pattern

中图分类号: 

  • 62K15