数学物理学报(英文版)

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CONSTRUCTING UNIFORM DESIGNS WITH TWO- OR THREE-LEVEL

覃红; 张尚立; 方开泰   

  1. 华中师范大学数学系, 武汉 430079
  • 收稿日期:2004-03-07 修回日期:2005-09-13 出版日期:2006-07-20 发布日期:2006-07-20
  • 通讯作者: 覃红
  • 基金资助:

    This work was partially supported by the NNSF of China(10441001),
    the Project sponsored by SRF for ROCS (SEM) and the NSF of Hubei Province. The second author's research was also partially supported by the Pre-studies Project of NBRP (2003CCA2400).

CONSTRUCTING UNIFORM DESIGNS WITH TWO- OR THREE-LEVEL

Qin Hong; Zhang Shangli; Fang Kaitai   

  1. Department of Mathematics, Central China Normal University, Wuhan 430079, China
  • Received:2004-03-07 Revised:2005-09-13 Online:2006-07-20 Published:2006-07-20
  • Contact: Qin Hong

摘要:

When the number of runs is large, to search for uniform designs in the sense of low-discrepancy is an NP hard problem. The number of runs of most of the available uniform designs is small (≤ 50). In this article, the authors employ a kind of the so-called Hamming distance method to construct uniform designs with two- or three-level such that some resulting uniform designs have a large number of runs. Several infinite classes for the existence of uniform designs with the same Hamming distances between any distinct rows are also obtained simultaneously. Two measures of uniformity, the centered L2-discrepancy (CD, for short) and wrap-around L2-discrepancy (WD, for short), are employed.

关键词: Discrepancy, Hadamard matrix, Hamming distance, uniform design

Abstract:

When the number of runs is large, to search for uniform designs in the sense of low-discrepancy is an NP hard problem. The number of runs of most of the available uniform designs is small (≤ 50). In this article, the authors employ a kind of the so-called Hamming distance method to construct uniform designs with two- or three-level such that some resulting uniform designs have a large number of runs. Several infinite classes for the existence of uniform designs with the same Hamming distances between any distinct rows are also obtained simultaneously. Two measures of uniformity, the centered L2-discrepancy (CD, for short) and wrap-around L2-discrepancy (WD, for short), are employed.

Key words: Discrepancy, Hadamard matrix, Hamming distance, uniform design

中图分类号: 

  • 62K15