波谱学杂志 ›› 1985, Vol. 2 ›› Issue (2): 131-144.

• 研究论文 • 上一篇    下一篇

光测磁共振及其在研究Ⅲ-Ⅴ族半导体材料中的应用

阎大卫   

  1. 吉林大学电子科学系
  • 收稿日期:1985-01-04 出版日期:1985-06-05 发布日期:2018-01-23
  • 基金资助:
    中国科学院科学基金资助

OPTICALLY DETECTED MAGNETIC RESONANCE AND ITS APPLICATION TO THE RESEARCH OF THE Ⅲ-Ⅴ SEMICONDUCTORS

Yan Dawei   

  1. Deqarttoent of Electronic Science, Jilin University, Changchun, CHINA
  • Received:1985-01-04 Online:1985-06-05 Published:2018-01-23

摘要: 光测磁共振技术是一种研究半导体中的杂质缺陷的有效工具,它可以提供有关杂质缺陷的电子结构及与辐射复合过程的关系的信息。这篇文章对光测磁共振的原理和技术进行了讨论,着重评述了最近几年来新的认识和进展。对光测磁共振技术在Ⅲ-V族半导体材料的辐射过程的研究中的应用也进行了评述,比较详细地介绍了对lnp:Mn及Gap:O的研究工作。

Abstract: Optically detected magnetic resonance (ODMR) technique has shown to be a successful tool for research work on the impurities and defects in semiconductors. This method may provide detailed information about the electronic structure of the impurities and defects and the relation between them and the tr-asition processes. The technique of ODMR, especially the new developments and understanding in last few years, has been discussed in this paper. The application of ODMR to the research field of impurities and defects and radiation processes in Ⅱ-V semiconductors has been reviewed and the research work about InP;Mn and GaP:O has been discussed as examples in detail.