APPLICATION OF MINIMUM PROJECTION UNIFORMITY CRITERION IN COMPLEMENTARY DESIGNS

doi:10.1016/S0252-9602(10)60035-5

Abstract

Abstract:

In this article, we consider the characterization problem in design theory. The objective is to characterize minimum
projection uniformity for two-level designs in terms of their complementary designs. Here, the complementary design means a design in which all the Hamming distances of any two runs are the same, which generalizes the concept of a pair of complementary designs in the literature. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity (MPU) rule to assess and compare two-level factorials.

Key words: minimum projection uniformity, complementary design, uniformity pattern

CLC Number:

62K15

SONG Shuo, QIN Hong. APPLICATION OF MINIMUM PROJECTION UNIFORMITY CRITERION IN COMPLEMENTARY DESIGNS[J].Acta mathematica scientia,Series B, 2010, 30(1): 180-186.

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